Description:
Reference #: 01070
The University of South Carolina is offering licensing opportunities for novel linear block copolymers with lower molecular weight and feature size to prepare templates for nanolithography.
Invention Description:
The subject invention utilizes grafted block copolymers, star copolymers, and multi-segmented block copolymers to prepare microphase-separated films with extremely small feature sizes. These films can further be used to prepare templates for block copolymer nanolithography.
Potential Applications:
Microelectronics such as DRAM, circuits, chips, memory, etc.
Advantages and Benefits:
This invention combines both high resolution and high quality films needed for lithography.
Background:
In order to reduce feature size and pitch in lithography, block copolymers are promising for making smaller features. However, reduction of molecular weight in linear block copolymers often results in film instability such as macroscopic de-wetting. This technology addresses this issue by using the grafted block copolymers, star copolymer, and multi-segmented block copolymer systems for enhanced interchain entanglement between polymer chains that are chemically linked to a common backbone (grafted and multi-segmented block copolymers) or a central core (star block copolymers).