Multiple Copolymer Systems as Templates for Block Copolymer Nanolithography


Reference #:  01070

The University of South Carolina is offering licensing opportunities for novel linear block copolymers with lower molecular weight and feature size to prepare templates for nanolithography.


Invention Description:

The subject invention utilizes grafted block copolymers, star copolymers, and multi-segmented block copolymers to prepare microphase-separated films with extremely small feature sizes. These films can further be used to prepare templates for block copolymer nanolithography.

Potential Applications:

Microelectronics such as DRAM, circuits, chips, memory, etc.

Advantages and Benefits:

This invention combines both high resolution and high quality films needed for lithography.


In order to reduce feature size and pitch in lithography, block ­copolymers are promising for making smaller features. However, reduction of molecular weight in linear block copolymers often results in film instability such as macroscopic de-wetting. This technology addresses this issue by using the grafted block copolymers, star copolymer, and multi-segmented block copolymer systems for enhanced interchain entanglement between polymer chains that are chemically linked to a common backbone (grafted and multi-segmented block copolymers) or a central core (star block copolymers).

Patent Information:
Title App Type Country Serial No. Patent No. File Date Issued Date Expire Date Patent Status
Multiple Copolymer Systems as Templates for Block Copolymer Nanolithography Utility United States 14/516,626 9,798,232 10/17/2014 10/24/2017   Issued
For Information, Contact:
Technology Commercialization
University of South Carolina
Chuanbing Tang
Christopher Hardy
Alper Nese
Jeffery Hayat
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